Honorary First for Sheffield Forgemasters
Sheffield Forgemasters' employees have become the very first collective to be awarded a group honorary doctorate by Sheffield Hallam University.
The award recognises the work carried out by Sheffield Forgemasters employees and the company's engineering achievements that have kept Sheffield on the world map as a leading centre of manufacturing excellence for more than 200 years.
Sheffield Forgemasters, which is one of the city's largest employers, has strong academic links with both of the city's universities and operates a dedicated apprenticeship scheme, which makes up as much as ten per cent of the 680 strong workforce at any one time.
David Bond, CEO at Sheffield Forgemasters, said: “I am delighted to accept an honorary degree from Sheffield Hallam University on behalf of Sheffield Forgemasters in recognition of all of our employees.
“The company has evolved enormously over the years and we have developed a globally renowned in-house group of metallurgists and engineers operating within our research, design & technology division and a company-wide skills set that is continually growing.
“I am very proud of the efforts put in by employees at all levels of our business to allow this company to excel at what it does.”
The awards ceremony was attended by a selection of Sheffield Forgemasters' employees and was collected by (left to right above): Dr Martin Kearney (Technical Director Forgings), Rebecca Broxholme (Forge Purchasing & PA to General Manager, Forge) and Arron Wheeler (Production Fitter).
Sheffield Forgemasters is a strategic partner to the UK defence industry, delivering highly specialised castings and forgings and also supplying into civil nuclear power, offshore oil and gas, materials processing and power generation markets.
The company's research, design & technology division is a world leader in delivering technology and engineering solutions for private and publicly funded research projects to advance manufacture in areas such as civil nuclear power generation.